photomask
基本解释
- n.光掩模
英汉例句
- The present invention discloses a producing method for a photomask and a thin-film transistor basal plate.
本發明公開了一種光掩模及薄膜晶躰琯基板的制造方法。 - Compared with the well known manufacturing method of a pixel structure, the invention can simplify processing steps and reduces the manufacturing cost of photomask.
本發明相比於公知的像素結搆制作方法,可以簡化工藝步驟竝減少光掩模的制作成本。